Nanometer-scale scanning sensors fabricated using stencil lithography
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Nanometer-scale scanning sensors fabricated using stencil lithography. / Champagne, A R; Couture, A J; Kuemmeth, Ferdinand; Ralph, D C.
In: Applied Physics Letters, Vol. 82, No. 7, 01.01.2003, p. 1111.Research output: Contribution to journal › Journal article › Research › peer-review
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TY - JOUR
T1 - Nanometer-scale scanning sensors fabricated using stencil lithography
AU - Champagne, A R
AU - Couture, A J
AU - Kuemmeth, Ferdinand
AU - Ralph, D C
PY - 2003/1/1
Y1 - 2003/1/1
N2 - We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.
AB - We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.
U2 - 10.1063/1.1554483
DO - 10.1063/1.1554483
M3 - Journal article
VL - 82
SP - 1111
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 7
ER -
ID: 44225772