Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics.
Publikation: Patent
Originalsprog | Engelsk |
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Patentnummer | P6493PC00 |
Land/Område | Danmark |
Status | Afsendt - aug. 2023 |
ID: 371617528